Impact of electron cyclotron wave resonance plasma on defect reduction in ZnO thin films.

• Tác giả: Yugo Akabe, Martin Čada, Marilou Cadatal-Raduban, Kota Hibino, Zdeněk Hubička, Anna Kapran, Michal Kohout, Yuki Maruyama, Jiří Olejníček, Shingo Ono, Aneta Písaříková, Carlito S Ponseca, Nobuhiko Sarukura, Ali Shuaib, Kohei Yamanoi
• Ngôn ngữ: eng
• Thông tin xuất bản: England : Scientific reports , 2025
• Bộ sưu tập: NCBI
• ID: 102737

Tóm tắt

This study presents the fabrication of highly photosensitive undoped zinc oxide (ZnO) thin films for vacuum ultraviolet (VUV) radiation detection, covering the wavelength range of 100-200 nm. ZnO films were deposited using hybrid pulsed reactive magnetron sputtering, assisted by ECWR (electron cyclotron wave resonance) plasma. Control of the ECWR power (P