Application of machine learning algorithms for the prediction of metformin removal with hydroxyl radical-based photochemical oxidation and optimization of process parameters.

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Tác giả: Emine Can-Güven, Narmin Garazade, Fatih Güven, Gamze Varank, Senem Yazici Guvenc

Ngôn ngữ: eng

Ký hiệu phân loại:

Thông tin xuất bản: Netherlands : Journal of hazardous materials , 2025

Mô tả vật lý:

Bộ sưu tập: NCBI

ID: 115763

This study investigated the effectiveness of hydroxyl radical-based photochemical oxidation processes on metformin (METF) removal, and the experimental data were modeled by machine learning (ML) algorithms. Hydrogen peroxide (HP), sodium percarbonate (PC), and peracetic acid (PAA) were used as hydroxyl radicals sources. Modeling was conducted using ML algorithms with the integration of additional experiments. Under optimum conditions (UV/PC: pH 5, PC 6 mM, UV/HP: pH 3, HP 6 mM, UV/PAA: pH 9, PAA 6 mM), the METF removal efficiency was 74.1 %, 40.7 %, and 47.9 % with UV/PC, UV/HP, and UV/PAA, respectively. The scavenging experiments revealed that hydroxyl and singlet oxygen radicals were dominant in UV/PC and hydroxyl radicals were predominant in UV/HP and UV/PAA. Nitrate negatively affected UV/HP, UV/PC, and UV/PAA, whereas chlorine had a positive impact. The EE/O were 0.682, 1.75, and 1.41 kWh/L for UV/PC, UV/HP, and UV/PAA, respectively. The experimental results were successfully modeled by ML models with high R
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