Optimization of Double-Gate Carbon Nanotube FET Characteristics for Short Channel Devices.

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Tác giả: Vijai M Moorthy, Viranjay M Srivastava, Rethinasamy Venkatesan

Ngôn ngữ: eng

Ký hiệu phân loại: 133.594 Types or schools of astrology originating in or associated with a

Thông tin xuất bản: United Arab Emirates : Recent patents on nanotechnology , 2025

Mô tả vật lý:

Bộ sưu tập: NCBI

ID: 151720

 INTRODUCTION: Transistors are the fundamental electronic component integrated into electronic devices' chips Carbon Nano Tube (CNT) based field. METHODS: Effect Transistor (FET) is a promising component for next-generation transistor technologies
  as it has high carrier mobility, device stability, and mechanical flexibility. Nevertheless, some shortcomings in the CNT FET's design prevent it from providing the best performance while preserving thermal stability. RESULTS: The structure and functionality of transistors with Double-Gate (DG) devices, which use carbon nanotubes as active channel regions, have been examined by the authors of this study. The DG CNT FET has been extensively simulated using an electronic device simulator with various device geometrics, including channel length, oxide thickness for its output, and transfer characteristics. In comparison to reported patents and published works, this demonstrates a significant improvement. CONCLUSION: A new perspective on the DG CNT FET's device performance characteristics is provided by this research work, which can be scaled down to minimum channel length without Short Channel Effects (SCEs).
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