The miniaturization of light-emitting diodes (LEDs) is pivotal in ultrahigh-resolution displays. Metal-halide perovskites promise efficient light emission, long-range carrier transport and scalable manufacturing for bright microscale LED (micro-LED) displays. However, thin-film perovskites with inhomogeneous spatial distribution of light emission and unstable surface under lithography are incompatible with the micro-LED devices. Continuous single-crystalline perovskite films with eliminated grain boundaries, stable surfaces and optical homogeneity are highly demanded for micro-LEDs, but their growth and device integration remain challenging. Here we realize the remote-epitaxy growth of crystalline perovskite films, enabling their seamless integration into micro-LEDs with a pixel size down to 4 μm. By incorporating a subnanometre graphene interlayer, we enable remote epitaxy and transfer of perovskites with relaxed strain. These micro-LEDs exhibit a high electroluminescence efficiency of 16.7% and a high brightness of 4.0 × 10