Electronic Impact of High-Energy Metal Deposition on Ultrathin Oxide Semiconductors.

• Tác giả: Tanveer Ahmed, Chi Chen, Shih-Chieh Chen, Tsung-Te Chou, Chi-Chung Kei, Min-Ju Kuo, Szuya Sandy Liao, Der-Hsien Lien, Yi-Yu Pan, Che-Chi Shih, Robert Tseng, Wei-Yen Woon
• Ngôn ngữ: eng
• Ký hiệu phân loại: 537.6223 Electrodynamics (Electric currents) and thermoelectricity
• Thông tin xuất bản: United States : Nano letters , 2025
• Bộ sưu tập: NCBI
• ID: 190740

Tóm tắt

High-energy metal deposition significantly impacts the performance and reliability of two-dimensional (2D) semiconductors and nanodevices. This study investigates the localized annealing effect in atomically thin In