Plasma-enhanced spatial ALD (PE-s-ALD) is an interesting technique for high-volume manufacturing of thin films at low-temperature. This technique is particularly appealing for conformal depositions on 3D surfaces for various applications, such as optical coatings, electrolyzers, and batteries. However, various crystallization and growth effects can influence the final film profile and properties, and understanding these effects and their interplay is key. This study investigates the complex growth mechanism of TiO