In this study, green micro-light-emitting diodes (μ-LEDs) with Al2O3 layers of varying thicknesses (0, 30, 60, and 90 nm) was fabricated using atomic layer deposition (ALD) technology. The optoelectronic characteristics of devices was measured and investigated. Current-Voltage (I V) measurements indicate that the ALD passi- vation layer effectively reduces leakage current. By applying the ABC + f(n) model to analyze external quantum efficiency (EQE), the internal physical mechanisms that the ALD passivation layer enhances the optoelectronic performance of green μ-LEDs was identified. Optical simulations demonstrated the transmittance relationship for different ALD passivation layer thicknesses, explaining improvements of light extraction efficiency (LEE). Furthermore, aging tests confirmed that the ALD passivation layer significantly increases the stability of green μ-LEDs. These findings offer valuable insights for enhancing the luminous efficiency and reliability of green μ-LEDs.
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