Advances in Chemical Vapor Deposition

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Tác giả: Dimitra Vernardou

Ngôn ngữ: eng

ISBN-13: 978-3039439232

Ký hiệu phân loại:

Thông tin xuất bản: Basel, Switzerland : MDPI - Multidisciplinary Digital Publishing Institute, 2021

Mô tả vật lý: 1 electronic resource (94 p.)

Bộ sưu tập: Tài liệu truy cập mở

ID: 235542

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue "Advances in Chemical Vapor Deposition" is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.
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