High voltage and high current density vertical GaN power diodes [electronic resource]

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Tác giả:

Ngôn ngữ: eng

Ký hiệu phân loại: 621.3152 Electrical, magnetic, optical, communications, computer engineering; electronics, lighting

Thông tin xuất bản: Washington, D.C. : Oak Ridge, Tenn. : United States. National Nuclear Security Administration ; Distributed by the Office of Scientific and Technical Information, U.S. Dept. of Energy, 2016

Mô tả vật lý: Size: p. 1170-1171 : , digital, PDF file.

Bộ sưu tập: Metadata

ID: 255815

 We report on the realization of a GaN high voltage vertical p-n diode operating at >
  3.9 kV breakdown with a specific on-resistance <
  0.9 m?.cm<
 sup>
 2<
 /sup>
 . Diodes achieved a forward current of 1 A for on-wafer, DC measurements, corresponding to a current density >
  1.4 kA/cm<
 sup>
 2<
 /sup>
 . An effective critical electric field of 3.9 MV/cm was estimated for the devices from analysis of the forward and reverse current-voltage characteristics. Furthermore this suggests that the fundamental limit to the GaN critical electric field is significantly greater than previously believed.
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