Atomic Layer Deposition for Semiconductors [electronic resource]

• Tác giả: Cheol Seong Hwang
• ISBN-13: 978-1461480549
• Ký hiệu phân loại: 541.37 Electrochemistry and magnetochemistry
• Thông tin xuất bản: New York, NY : Springer US : Imprint: Springer, 2014.
• Mô tả vật lý: X, 263 p. 170 illus., 81 illus. in color. , online resource.
• Bộ sưu tập: Tài liệu truy cập mở
• ID: 309676
• Chủ đề: 1. Computer storage devices; 2. Electric power production; 3. Electrochemistry; 4. Memory management (Computer science); 5. Semiconductors

Tóm tắt

Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area  for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discusses ALD for all modern semiconductor devices, the basic chemistry of ALD, and models of ALD processes. The book also details ALD for both mass produced memories and emerging memories. Each chapter of the book provides history, operating principles, and a full explanation of ALD processes for each device.