Advanced Interconnect and Packaging

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Tác giả: Wensheng Zhao

Ngôn ngữ: eng

ISBN-13: 978-3036567327

ISBN-13: 978-3036567334

ISBN: books978-3-0365-6732-7

Ký hiệu phân loại:

Thông tin xuất bản: Basel MDPI - Multidisciplinary Digital Publishing Institute 2023

Mô tả vật lý: 1 electronic resource (266 p.)

Bộ sưu tập: Tài liệu truy cập mở

ID: 376901

Unlike transistors, the continuous downscaling of feature size in CMOS technology leads to a dramatic rise in interconnect resistivity and concomitant performance degradation. At nanoscale technology nodes, interconnect delay and reliability become the major bottlenecks faced by modern integrated circuits. To resolve these interconnect problems, various emerging technologies, including airgap, nanocarbon, optical, and through-silicon via (TSV), have been proposed and investigated. For example, by virtue of TSV technology, dies can be stacked to increase the integration density. More importantly, 3D integration and packaging also offer the most promising platform to implement "More-than-Moore" technologies, providing heterogeneous materials and technologies on a single chip. The "Advanced Interconnect and Packaging" Special Issue seeks to showcase research papers on new developments in advanced interconnect and packaging, i.e., on the design, modeling, fabrication, and reliability assessment of emerging interconnect and packaging technologies. Additionally, there are two interesting papers on carbon nanotube interconnects and interconnect reliability issues.
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