High-Pressure Physical and Chemical Behaviors of Minerals and Rocks

 0 Người đánh giá. Xếp hạng trung bình 0

Tác giả: Lidong Dai, Haiying Hu, Jianjun Jiang

Ngôn ngữ: eng

ISBN-13: 978-3036572901

ISBN-13: 978-3036572918

ISBN: books978-3-0365-7291-8

Ký hiệu phân loại:

Thông tin xuất bản: Basel MDPI - Multidisciplinary Digital Publishing Institute 2023

Mô tả vật lý: 1 electronic resource (172 p.)

Bộ sưu tập: Tài liệu truy cập mở

ID: 376983

 The Key Laboratory of High-temperature and High-pressure Study of the Earth's Interior belongs to the Institute of Geochemistry, Chinese Academy of Sciences, China. It is a unique and authoritative key laboratory at the provincial and ministerial levels. The Key High-Pressure Laboratory is primarily focused on the high-temperature and high-pressure experimental sciences, in combination with filed geophysical observation, theoretical calculation and advanced analysis tests in order to explore the chemical composition, cycling structure, geological state, material circulation, etc., of deep Earth. The mainstream research subjects of the Laboratory mainly include: research and development of experimental platforms and measurement techniques at high temperatures and high pressures
  high-pressure material synthesis and hot-pressed sintering techniques
  physical and chemical characterizations (e.g. electrical conductivity, thermal conductivity, ultrasonic wave velocity, etc.) of minerals and rocks at conditions of high pressure and different oxygen fugacities by virtue of representative high-pressure apparatus, including autoclaves, piston cylinders, multi-anvil presses, diamond anvil cells and shock waves
  high-pressure physiochemical behavior and storage states in the geological fluid and melt of deep Earth interior
  high-pressure theoretical calculations
  and high-pressure applications in the service of national economical and societal development.
Tạo bộ sưu tập với mã QR

THƯ VIỆN - TRƯỜNG ĐẠI HỌC CÔNG NGHỆ TP.HCM

ĐT: (028) 71010608 | Email: tt.thuvien@hutech.edu.vn

Copyright @2024 THƯ VIỆN HUTECH