ẢNH HƯỞNG CỦA NHIỆT ĐỘ Ủ ĐẾN HÌNH THÁI BỀ MẶT VÀ TÍNH CHẤT QUANG CỦA MÀNG NiO LẮNG ĐỌNG BẰNG PHÚN XẠ PHẢN ỨNG=IMPACT OF ANNEALING TEMPERATURES ON SURFACE MORPHOLOGY AND OPTICAL PROPERTIES OF REACTIVE SPUTTER DEPOSITED NiO FILMS

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Tác giả: Hải Đăng Ngô, Khắc Bình Nguyễn, Hoài Phương Phạm, Minh Tâm Phạm, Thị Kim Hằng Phạm, Bảo Quân Trần

Ngôn ngữ: vie

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Thông tin xuất bản: Tạp chí Khoa học và Công nghệ - Đại học Thái Nguyên, 2024

Mô tả vật lý: tr.45979

Bộ sưu tập: Metadata

ID: 484480

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In this work, the reactive radio frequency magnetron sputtering was used to deposit nickel oxide (NiO) thin films on Al2O3/glass substrate at 250 °C. Subsequently, the NiO films were subjected to annealing at different temperatures (300 °C, 350 °C, 400 °C, 450 °C, and 600 °C) in ambient air. The influence of temperature annealing on the crystal structure, surface morphology, and optical properties of NiO thin film was investigated using X-ray diffraction, scanning electron microscopy, and UV-Vis spectroscopy, respectively. The X-ray diffraction analysis reveals that the NiO films exhibit a distinct preference for crystal orientations along the (111) and (200) planes. When the temperature is raised over 450 °C during annealing, the (200) peak disappears and a new (220) peak appears. The scanning electron microscopy images clearly indicate a notable enhancement in surface roughness and a significant improvement in grain size. Furthermore, all of the samples exhibit an average transmittance of 65% across the wavelength range of 400 to 800 nm, as determined by UV-vis spectra. The optical band gap was determined to range from 3.467 to 3.658 eV. Hall measurements reveal the high film resistivity of 1.84 ×103 to 6.15 ×103 Ω.cm, which increases in accordance with annealing temperature. This outcome establishes a foundation for utilizing NiO thin films in UV-photodetectors.Trong nghiên cứu này, phương pháp phún xạ phản ứng được sử dụng để lắng đọng màng NiO trên Al2O3/lam kính ở nhiệt độ 250 °C. Sau đó, màng NiO được ủ ở các nhiệt độ khác nhau trong không khí (300 °C, 350 °C, 400 °C, 450 °C, và 600 °C). Ảnh hưởng của nhiệt độ ủ đến cấu trúc tinh thể, hình thái bề mặt và tính chất quang của màng NiO được nghiên cứu bằng nhiễu xạ tia X, kính hiển vi điện tử quét, quang phổ UV-Vis. Phân tích nhiễu xạ tia X cho thấy màng NiO phát triển theo hướng (111) và (200). Khi nhiệt độ ủ trên 450 °C, đỉnh (200) biến mất và đỉnh mới (220) xuất hiện. Hình ảnh từ kính hiển vi điện tử quét cho thấy sự tăng cường về độ nhám bề mặt và tăng kích thước hạt. Các mẫu đều thể hiện độ truyền qua trung bình trên 65% trong vùng bước sóng 400 - 800 nm, được xác định bằng quang phổ UV-Vis. Năng lượng vùng cấm quang được xác định khoảng 3,467 - 3,658 eV. Kết quả Hall cho thấy màng có điện trở suất cao từ 1,84 ×103 đến 6,15 ×103 Ω.cm, có xu hướng tăng khi tăng nhiệt độ ủ. Kết quả của nghiên cứu này tạo tiền đề cho việc ứng dụng màng NiO cho bộ tách sóng quang UV.

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