Micro-hardness and intrinsic stress are important technological parameters in depositing TiN thin film on mechanical details. In this study, the distribution of stress in measuring micro-harness process is simulated by ELASTICA. Thin TiN films were deposited by sputtering planar magnetron method by Hanoi University of Science and Technology (HUST), micro-hardness measured at high temperature, simulated heat process used in high perfonnance cutting operations, in the range 1600-1800HV at room temperature and reduced when temperature increased. The influence of Bias Voffage to Young module was calculated by X-Ray Diffraction (XRD) patterns and appropriated with simulation resuffs.