Phase Controlled Metalorganic Chemical Vapor Deposition Growth of Wafer-Scale Molybdenum Ditelluride.

• Tác giả: Zakaria Y Al Balushi, David Dang, Bum Jun Kim, Ho Wai Howard Lee, Jiayun Liang, Andrei Osinsky, Vitali Soukhoveev, Derick Tseng, Ke Wang
• Ngôn ngữ: eng
• Ký hiệu phân loại: 781.59 *Music reflecting other themes and subjects
• Thông tin xuất bản: United States : ACS nanoscience Au , 2025
• Bộ sưu tập: NCBI
• ID: 672724

Tóm tắt

Metalorganic chemical vapor deposition (MOCVD) has become a pivotal technique for developing wafer-scale transition metal dichalcogenide (TMD) 2D materials. This study investigates the impact of MOCVD growth conditions on achieving uniform and selective polymorph phase control of MoTe