The precise and deterministic integration of fluorescent emitters with photonic nanostructures is an important challenge in nanophotonics and key to the realization of hybrid photonic systems, supporting effects such as emission enhancement, directional emission, and strong coupling. Such integration typically requires the definition or immobilization of the emitters at defined positions with nanoscale precision. While various methods were already developed for creating localized emitters, in this work we present a new method for the deterministic fabrication of fluorescent nanostructures featuring well-defined optical transitions
it works with a minimal amount of steps and is scalable. Specifically, electron-beam lithography is used to directly pattern a mixture of the negative-tone electron-beam resist with the europium complex Eu(TTA)