Unveiling surface reactivity: the crucial role of auxiliary ligands in gallium amidinate-based precursors for atomic layer deposition.

• Tác giả: Audrey Auffrant, Sophie Bourcier, Muriel Bouttemy, Nicolas Casaretto, Damien Coutancier, Julien Hervochon, Paul-Alexis Pavard, Geoffrey Pourtois, Eva Pugliese, Nathanaelle Schneider, Bram van der Linden
• Ngôn ngữ: eng
• Thông tin xuất bản: England : Dalton transactions (Cambridge, England : 2003) , 2025
• Bộ sưu tập: NCBI
• ID: 717718

Tóm tắt

Two novel gallium precursors for Atomic Layer Deposition (ALD), LGaMe2 and LGa(NMe2)2 with L =