Enhancement of Osseointegration via Endogenous Electric Field by Regulating the Charge Microenvironments around Implants.

• Tác giả: Hao Cui, Yuxin Gong, Xiang Liang, Bingheng Lu, Sijia Na, Kun Qi, Xiaoxi Shao, Junbo Tu, Linyang Xie, Fangfang Xu, Ming Yu, Guangbin Zhao, Nan Zhu, Xuan Zhu
• Ngôn ngữ: eng
• Thông tin xuất bản: Germany : Advanced healthcare materials , 2025
• Bộ sưu tập: NCBI
• ID: 736804

Tóm tắt

The regulation of the charged microenvironment around implants is an effective way to promote osseointegration. Although homeostasis of the charged microenvironment plays an integral role in tissues, current research is externally invasive and unsuitable for clinical applications. In this study, functional materials with different surface potential differences are prepared by changing the spatial layout of Ta and Ag on the surface of a Ti-6Al-4V alloy (TC4). This naturally formed an endogenous electric field (EEF) with a negatively charged cell membrane after in vivo implantation and promoted osseointegration at the interface between the bone and implant through the upregulation of Ca