Ultralow Voltage Operation of p- and n-FETs Enabled by Self-Formed Gate Dielectric and Metal Contacts on 2D Tellurium.

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Tác giả: Jian-Yu Lin, Zehao Lin, Linjia Long, Chang Niu, Pukun Tan, Haiyan Wang, Wenzhuo Wu, Peide D Ye, Yizhi Zhang

Ngôn ngữ: eng

Ký hiệu phân loại: 005.2 Programming for specific types of computers, for specific operating systems, for specific user interfaces

Thông tin xuất bản: Germany : Advanced materials (Deerfield Beach, Fla.) , 2025

Mô tả vật lý:

Bộ sưu tập: NCBI

ID: 743296

The ongoing demand for more energy-efficient, high-performance electronics is driving the exploration of innovative materials and device architectures, where interfaces play a crucial role due to the continuous downscaling of device dimensions. Tellurium (Te), in its 2D form, offers significant potential due to its high carrier mobility and ambipolar characteristics, with the carrier type easily tunable via surface modulation. In this study, atomically controlled material transformations in 2D Te are leveraged to create intimate junctions, enabling near-ideal field-effect transistors (FETs) for both n-type and p-type operation. A NiTe
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