Biomechanical comparison of tendon repair techniques: Bunnell suture leads in mode of failure and minimally invasive configuration in elongation.

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Tác giả: Stefano Campi, Vincenzo Denaro, Margaux D'Hooghe, Francisco Forriol, Umile Giuseppe Longo, Martina Marino, Maristella Saccomanno, Kristian Samuelsson

Ngôn ngữ: eng

Ký hiệu phân loại: 123.3 Chance

Thông tin xuất bản: United States : Journal of experimental orthopaedics , 2025

Mô tả vật lý:

Bộ sưu tập: NCBI

ID: 743511

PURPOSE: In this experimental study, the Minimally Invasive Configuration (MIC), the Bunnell, Kessler and modified Bunnell-Kessler techniques for tendon rupture repair were compared in terms of the following biomechanical parameters: maximum load, mode of failure, failure elongation, tension/construct elongation and stiffness (Young's modulus). The scope of comparison involves understanding the properties of each suture technique in hopes of eventually contributing to surgical decision-making. METHODS: Thirty-two frozen ovine specimens were obtained, and transverse tenotomy was performed on each. Eight tendons were randomly allocated to each technique. Specimens were tested performing a unidirectional tensile load to failure using a servo-hydraulic testing device. The tendons were also loaded to failure at a rate of 10 mm/s. The total length of the construct was defined as the distance from the two clamps. Stiffness was calculated by determining the slope of the force-displacement curve in the linear region. Total failure was defined as a drop of measured force or rupture of the tendon-suture complex. RESULTS: In the mode of failure, Tukey's post hoc test showed a statistically significant difference between the Bunnell group and the other three groups ( CONCLUSION: The Bunnell suture performed best in terms of mode of failure, while the MIC suture technique outperformed the rest in terms of tension/construct elongation. Findings show sufficient biomechanical evidence to support the ongoing clinical application of all techniques. LEVEL OF EVIDENCE: Level V.
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