Analysis of the Vapor Phase Dynamics during iCVD: Free Radical Initiation by

• Tác giả: Simon Shindler, Rong Yang
• Ngôn ngữ: eng
• Ký hiệu phân loại: 339.523 Budget surpluses and deficits
• Thông tin xuất bản: United States : Langmuir : the ACS journal of surfaces and colloids , 2025
• Bộ sưu tập: NCBI
• ID: 744132

Tóm tắt

While initiated chemical vapor deposition (iCVD) has been used in a wide range of fundamental and applied studies in the past two decades, little is known about the reactive vapor phase, leading to inconsistent treatment of the initiation process in the existing literature. Di-